Why deterministically implant ions?

Many quantum devices are based on single impurity atoms (or defects) in a solid-state host. These single impurity atoms/defects must be positioned with ~nm precision. When done accurately, these atoms/defects can be used as qubits, which exhibit long coherence times, CMOS compatibility and scalability. To do this successfully at scale, we require a level of spatial and fluence control that conventional ion implantation does not offer.

Deterministic requirements:

Spatial precision
  • Beam spot size
  • Device alignment
  • Patterning
  • Implant straggle

Largely solved with conventional FIB
technology
Well understood but little to no control for given ion species, target material and energy

Spatial precision
  • Poisson statistics
  • Detection efficiency

New issues to address for reliable single ion implantation

The SIMPLE implanters:

  • Deterministic Ion Implantation facility SIMPLE – Single Ion Multispecies Positioning at Low
    Energy
  • “Q-one” by Ionoptika
  • Based on focused ion beam
  • Engineered for quantum devices
  • 2 tools 🡪 2 different ion sources
  • Liquid metal (alloy) ion source
  • Duoplasmatron source for gases

Main features:

  • Versatile to multiple ion species
  • 10-25 kV sub-surface implantation