Rutherford Backscattering Spectrometry
Matthew Sharpe

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R. J. Cox, et . Adv. Mater. 2024, 36, 2408437.
DOI: https://doi.org/10.1002/adma.202408437

RBS channelling: A comparative study of epitaxial InGaAsBi/InP structures

☐  The work uses RBS channelling to investigate the crystallographic           quality, defect structure, and damage (or implantation-induced               changes) in a material (InGaAsBi/InP structures) following some            processing or irradiation.

☐  Through channelling measurements:
      ☐  Determine the fraction of atoms displaced from lattice sites
      ☐  Identify damage depth profiles
      ☐  Assess the recovery/annealing behaviour of the structure.
☐  This work links the degree of lattice disorder (using RBS                           channelling) to material performance (e.g., electrical, optical or               mechanical) or to how growth conditions affect structural integrity.