Ion Implantation & Irradiation
 Ella Schneider

📰

Preprint: Ella B Schneider, et al. 2025; arXiv:2510.14495  https://arxiv.org/abs/2510.14495

Submitted to Nano Letters

Enhanced Secondary Electron Detection of Single Ion Implants in Silicon Through Thin SiO2 Layers

☐  Deterministic placement of single dopants is essential       for scalable quantum devices based on group-V                 donors in silicon.
☐  Using  the single ion multispecies positioning at low           energy (SIMPLE)             tool, we demonstrate a non-         destructive, high-efficiency method for detecting               individual ion implantation events using secondary           electrons (SEs)
☐  Using low-energy Sb ions implanted into undoped             silicon, we achieve up to 98% single-ion detection             efficiency, verified by calibrated ion-current                       measurements before and after implantation.
☐  We find that introducing a controlled SiO2 capping           layer significantly enhances SE yield, consistent with         an increased electron mean free path in the oxide,             while maintaining high probability of successful ion           deposition in the underlying substrate.