UKRI-EPSRC-Surrey-IonBeamCentre-29

Ion Implantation and Irradiation

Ion Implantation and Irradiation are key processes for modifying materials at the atomic level. Ion implantation precisely introduces ions to adjust electrical and physical properties, vital in semiconductor devices. Ion irradiation exposes materials to high-energy ions, simulating radiation damage or improving surface durability, with applications across industries like aerospace and nuclear energy.

Controllable Materials Modification

  • 0.2-2MV High Energy Implanter
  • 0.1-1.25MV High Energy Implanter
  • 2-200kV High Current Implanter
  • Extensive range of ion species
  • Implantation 2keV-4MeV (up to 10mA)
  • Sample size mm² to 40cmx40cm
  • Hot (700°C) or cold (~10K)
  • Sample Chambers in Class 100 clean (ISO5) room
  • Two Single Ion Implanters