Ion Implantation & Irradiation
 Ella Schneider

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Preprint: Ella B Schneider, et al. 2025; arXiv:2510.14495  https://arxiv.org/abs/2510.14495

Submitted to Nano Letters

Enhanced Secondary Electron Detection of Single Ion Implants in Silicon Through Thin SiO2 Layers

☐   Deterministic placement of single dopants is essential for              scalable quantum devices based on group-V donors in silicon.
☐   Using the single ion multispecies positioning at low                        energy (SIMPLE) tool, we demonstrate a non-destructive,              high- efficiency method for detecting individual ion                        implantation  events using secondary electrons (SEs)
☐   Using low-energy Sb ions implanted into undoped                          silicon, we achieve up to 98% single-ion detection                            efficiency, verified by calibrated ion-current measurements          before and after implantation.
☐  We find that introducing a controlled SiO2 capping layer               significantly enhances SE yield, consistent with an increased         electron mean free path in the oxide, while maintaining high         probability of successful ion deposition in the underlying               substrate.

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